Browsing by Author "Franke, Joern-Holger"

Dual monopole exposure strategy to improve extreme ultraviolet imaging

Elucidating the role of imaging metrics for variability and after etch defectivity

EPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D

EUV dose reduction for pitch 28 nm line-space

EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Experimental verification of high-NA imaging simulations using SHARP

Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations

Fundamental understanding and experimental verification of bright versus dark field imaging

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Hyper NA EUV lithography: an imaging perspective

Image contrast metrology for EUV lithography

Imaging validation for LS of dark field low-n vs Ta-based absorber masks

Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization

Mask innovations on the eve of high NA EUV lithography

Metal layer single EUV expose at pitch 28nm: how bright field and NTD resist advantages align

Pupil optimization for after etch defectivity: what imaging metrics matter?

SAQP and EUV block patterning of BEOL metal layers on IMEC's iN7 platform

Self-aligned block and fully self-aligned via for iN5 Metal 2 Self-aligned quadruple patterning