Browsing by Author "Franke, Joern-Holger"

Advanced PnR Logic Patterning Enabled by High-NA EUV Lithography

Best Focus alignment through pitch strategies for Hyper NA EUV lithography

Dual monopole exposure strategy to improve extreme ultraviolet imaging

Elucidating the role of imaging metrics for variability and after etch defectivity

EPE analysis of sub-N10 BEOL structures with Coventor's SEMulator3D

EUV dose reduction for pitch 28 nm line-space

EUV single exposure Tip-to-Tip variability control through PEB process optimization in BEOL layers

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Experimental verification of high-NA imaging simulations using SHARP

Extending 0.33NA EUVL to 28 nm pitch using alternative mask and controlled aberrations

Extending logic metal printing with sub-resolution grating in high and hyper NA EUV lithography

Fundamental understanding and experimental verification of bright versus dark field imaging

High-NA EUV mask pattern characterization using advanced mask CD-SEM metrology

Hyper NA EUV lithography: an imaging perspective

Image contrast metrology for EUV lithography

Imaging validation for LS of dark field low-n vs Ta-based absorber masks

Improving exposure latitude and aligning best focus through pitch by curing M3D effects with controlled aberrations

Increasing throughput in EUV logic applications with thinner low-n masks and wavefront optimization

Logic and memory patterning breakthrough using High-NA lithography

Mask innovations on the eve of high NA EUV lithography