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Browsing by Author "Lee, Jae Woo"

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    1/f noise analysis of replacement metal gate bulk p-type fin field effect transistor

    Lee, Jae Woo
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    Cho, Moon Ju
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    Simoen, Eddy  
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    Ritzenthaler, Romain  
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    Togo, Mitsuhiro
    Journal article
    2013-03, Applied Physics Letters, (102) 7, p.73503
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    Assessment of the impact of inelastic tunneling on the frequency-depth conversion from low-frequency noise spectra

    Simoen, Eddy  
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    Lee, Jae Woo
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    Claeys, Cor
    Journal article
    2014, IEEE Transactions on Electron Devices, (61) 2, p.634-637
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    Automatic Prediction of Metal-Oxide-Semiconductor Field-Effect Transistor Threshold Voltage Using Machine Learning Algorithm

    Choi, Seoyeon
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    Park, Dong Geun
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    Kim, Min Jung
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    Bang, Seain
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    Kim, Jungchun
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    Jin, Seunghee
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    Huh, Ki Seok
    Journal article
    2023, ADVANCED INTELLIGENT SYSTEMS, (5) 1, p.Art. 2200302
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    Automatic prediction of MOSFETs threshold voltage by machine learning algorithms

    Choi, Seoyeon
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    Park, Dong Geun
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    Kim, Min Jung
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    Bang, Seain
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    Kim, Jungchun
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    Jin, Seunghee
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    Huh, Ki Seok
    Proceedings paper
    2023, 7th IEEE Electron Devices Technology and Manufacturing Conference (EDTM), MAR 07-10, 2023
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    Bulk FinFET Fin height control using Gas Cluster Ion Beam (GCIB) - Location Specific Processing (LSP)

    Kim, Min-Soo  
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    Ritzenthaler, Romain  
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    Everaert, Jean-Luc
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    Fernandez, Luis
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    Devriendt, Katia  
    Proceedings paper
    2013, Extended Abstracts of the International Conference on Solid State Devices and Materials - SSDM, 24/09/2013, p.706-707
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    Comparison of temperature dependent carrier transport in FinFET and gate-all-Around nanowire FET

    Kim, Soohyun
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    Kim, Jungchun
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    Jang, Doyoung  
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    Ritzenthaler, Romain  
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    Parvais, Bertrand  
    Journal article
    2020, Applied Sciences, (10) 8, p.2979
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    Deep Understanding of Electron Beam Effects on 2D Layered Semiconducting Devices Under Bias Applications

    Lee, Kookjin  
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    Ji, Hyunjin
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    Kim, Yanghee
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    Kaczer, Ben  
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    Lee, Hyebin
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    Ahn, Jae-Pyoung
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    Choi, Junhee
    Journal article
    2022, ADVANCED MATERIALS INTERFACES, (9) 9, p.Art. 2102488
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    Defect spectroscopy of sidewall interfaces in gate-all-around silicon nanosheet FET

    Lee, Kookjin  
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    Kim, Yeonsu
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    Lee, Hyebin
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    Park, Sojeong
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    Lee, Yongwoo
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    Joo, Min-Kyu
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    Ji, Hyunjin
    Journal article
    2021, NANOTECHNOLOGY, (32) 16, p.165202
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    Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

    Togo, Mitsuhiro
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    Sasaki, Yuichiro
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    Zschaetzsch, Gerd
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    Boccardi, Guillaume  
    Proceedings paper
    2013, Symposium on VLSI Technology, 11/06/2013, p.T196-T197
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    Heated implantation with amorphous carbon CMOS mask for scaled FinFETs

    Togo, Mitsuhiro
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    Sasaki, Yuichiro
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    Zschaetzsch, Gerd
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    Boccardi, Guillaume  
    Proceedings paper
    2013, Symposium on VLSI Technology - VLSIT, 10/06/2013, p.196-197
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    Impact of multi-gate device architectures on digital and analog circuits and its implications on system-on-chip technologies

    Thean, Aaron  
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    Wambacq, Piet  
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    Lee, Jae Woo
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    Cho, Moon Ju
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    Veloso, Anabela  
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    Sasaki, Yuichiro
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.448-451
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    Improved channel hot carrier reliability in p-FinFETs with replacement metal gate by a nitrogen post deposition anneal process

    Cho, Moon Ju
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    Arimura, Hiroaki  
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    Lee, Jae Woo
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    Kaczer, Ben  
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    Veloso, Anabela  
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    Boccardi, Guillaume  
    Journal article
    2014-03, IEEE Transactions on Device and Materials Reliability, (14) 1, p.408-412
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    Improved sidewall doping with small implant angle by AsH3 Ion assisted deposition and doping process for scaled NMOS Si bulk FinFETs

    Sasaki, Yuichiro
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    Godet, Ludovic
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    Chiarella, Thomas  
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    Brunco, David
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    Rockwell, Tyler
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    Lee, Jae Woo
    Proceedings paper
    2013, International Electron Devices Meeting - IEDM, 9/12/2013, p.542-545
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    Low frequency noise analysis for post-treatment of replacement metal gate FinFET

    Lee, Jae Woo
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    Simoen, Eddy  
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    Veloso, Anabela  
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    Cho, Moon Ju
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    Arimura, Hiroaki  
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    Boccardi, Guillaume  
    Journal article
    2013, IEEE Transactions on Electron Devices, (60) 9, p.2960-2962
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    Low frequency noise performance of gate-first and replacement metal gate CMOS technologies

    Claeys, Cor
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    Lee, Jae Woo
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    Simoen, Eddy  
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    Veloso, Anabela  
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    Horiguchi, Naoto  
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    Paraschiv, Vasile  
    Proceedings paper
    2013, IEEE International Conference on Electron Devices and Solid-State Circuits - EDSSC, 3/06/2013, p.1-2
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    Low-frequency-noise-based oxide trap profiling in replacement high-k/metal gate pMOSFETs

    Simoen, Eddy  
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    Lee, Jae Woo
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    Veloso, Anabela  
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    Paraschiv, Vasile  
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    Horiguchi, Naoto  
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    Claeys, Cor
    Journal article
    2014, ECS Journal of Solid State Science and Technology, (3) 6, p.Q127-Q131
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    Low-frequency-noise-based oxide trap profiling in replacement high-k/metal-gate pMOSFETs

    Simoen, Eddy  
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    Lee, Jae Woo
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    Veloso, Anabela  
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    Paraschiv, Vasile  
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    Horiguchi, Naoto  
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    Claeys, Cor
    Meeting abstract
    2013, 224th ECS Fall Meeting: Symposium on ULSI Process Integration, 27/10/2013, p.2246
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    Mobility analysis of surface roughness scattering in FinFET devices

    Lee, Jae Woo
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    Jang, Doyoung  
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    Mouis, Mireille
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    Kim, Gyu Tae
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    Chiarella, Thomas  
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    Hoffmann, Thomas Y.
    Journal article
    2011, Solid-State Electronics, (62) 1, p.195-201
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    Modeling and Understanding the Compact Performance of h-BN Dual-Gated ReS2 Transistor

    Lee, Kookjin  
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    Choi, Junhee
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    Kaczer, Ben  
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    Grill, Alexander  
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    Lee, Jae Woo
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    Van Beek, Simon  
    ;
    Bury, Erik  
    Journal article
    2021, ADVANCED FUNCTIONAL MATERIALS, (31) 23, p.2100625
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    Performance and reliability of high-mobility Si0.55Ge0.45 p-channel FinFETs based on epitaxial cladding of Si fins

    Mertens, Hans  
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    Ritzenthaler, Romain  
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    Hikavyy, Andriy  
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    Franco, Jacopo  
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    Lee, Jae Woo
    ;
    Brunco, David
    Proceedings paper
    2014, Symposium on VLSI Technology, 9/06/2014, p.58-59
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