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Browsing by Author "Rzepa, Gerhard"

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    A brief overview of gate oxide defect properties and their relation to MOSFET instabilities and device and circuit time-dependent variability

    Kaczer, Ben  
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    Franco, Jacopo  
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    Weckx, Pieter  
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    Roussel, Philippe  
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    Putcha, Vamsi  
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    Bury, Erik  
    Journal article
    2018, Microelectronics Reliability, 81, p.186-194
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    A Physical TCAD Mobility Model of Amorphous In-Ga-Zn-O (a-IGZO) Devices with Spatially Varying Mobility Edges, Band-Tails, and Enhanced Low-Temperature Convergence

    Thesberg, Mischa
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    Schanovsky, Franz
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    Zhao, Ying  
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    Karner, Markus
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    Gonzalez-Medina, Jose Maria
    Journal article
    2024, MICROMACHINES, (15) 7, p.Art. 829
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    Accelerated Capture and Emission (ACE) measurement pattern for efficient BTI characterization and modeling

    Wu, Zhicheng  
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    Franco, Jacopo  
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    Claes, Dieter  
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    Rzepa, Gerhard
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    Roussel, Philippe  
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    Collaert, Nadine  
    Proceedings paper
    2019, 2019 IRPS IEEE International Reliability Physics Symposium - IRPS, 31/03/2019, p.1-7
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    Border trap based modeling of SiC transistor transfer characteristics

    Tyaginov, Stanislav  
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    Jech, Markus
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    Rzepa, Gerhard
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    Grill, Alexander  
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    El-Sayed, Al-Moatasem
    Proceedings paper
    2018, International Integrated Reliability Workshop (IIRW), 7/11/2018, p.1-5
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    BTI reliability and time-dependent variability of stacked gate-all-around Si nanowire transistors

    Vaisman Chasin, Adrian  
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    Franco, Jacopo  
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    Kaczer, Ben  
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    Putcha, Vamsi  
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    Weckx, Pieter  
    Proceedings paper
    2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.5C-4.1-5C-4.7
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    BTI reliability improvement strategies in low thermal budget gate dtacks for 3D sequential integration

    Franco, Jacopo  
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    Wu, Zhicheng  
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    Rzepa, Gerhard
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    Vandooren, Anne  
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    Arimura, Hiroaki  
    Proceedings paper
    2018-12, IEEE International Electron Devices Meeting - IEDM, 1/12/2018, p.787-790
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    Characterization and modeling of reliability issues in nanoscale devices

    Rzepa, Gerhard
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    Goes, Wolfgang
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    Kaczer, Ben  
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    Grasser, Tibor
    Proceedings paper
    2015, IEEE International Symposium on Circuits and Systems - ISCAS, 24/05/2015, p.2445-2448
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    Characterization of oxide defects in InGaAs MOS gate stacks for high-mobility n-channel MOSFETs

    Franco, Jacopo  
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    Putcha, Vamsi  
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    Vais, Abhitosh  
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    Sioncke, Sonja
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    Waldron, Niamh  
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    Zhou, Daisy  
    Proceedings paper
    2017, IEEE International Electron Devices Meeting - IEDM, 2/12/2017, p.175-178
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    Co-integration Process Compatible Input/Output (I/O) Device Options for GAA Nanosheet Technology

    Gaddemane, Gautam  
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    Bhuwalka, Krishna K.
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    Matagne, Philippe  
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    Rzepa, Gerhard
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    Van de Put, Maarten  
    Proceedings paper
    2022, 52nd IEEE European Solid-State Device Research Conference (ESSDERC), SEP 19-22, 2022, p.265-268
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    COMPHY - A compact-physics framework for unified modeling of BTI

    Rzepa, Gerhard
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    Franco, Jacopo  
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    O'Sullivan, Barry  
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    Subirats, Alexandre
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    Simicic, Marko  
    Journal article
    2018, Microelectronics Reliability, 85, p.49-65
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    Comphy v3.0-A compact-physics framework for modeling charge trapping related reliability phenomena in MOS devices

    Waldhoer, Dominic
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    Schleich, Christian
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    Michl, Jakob
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    Grill, Alexander  
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    Claes, Dieter  
    Journal article
    2023, MICROELECTRONICS RELIABILITY, (146) July, p.Art. 115004
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    Complete extraction of defect bands responsible for instabilities in n and pFinFETs

    Rzepa, Gerhard
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    Waltl, Michael
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    Goes, Wolfgang
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    Kaczer, Ben  
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    Franco, Jacopo  
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    Chiarella, Thomas  
    Proceedings paper
    2016, IEEE Symposium on VLSI Technology, 13/06/2016, p.208-209
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    DTCO of Nanosheet and Forksheet Architectures: Exploring Dielectric Walls, Contacting Schemes, and Active Regions for Optimized RO Performance

    Gaddemane, Gautam  
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    Schuddinck, Pieter  
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    Bhuwalka, Krishna
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    Rzepa, Gerhard
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    Mirabelli, Gioele  
    Proceedings paper
    2024, 8th Electron Devices Technology & Manufacturing Conference (EDTM), MAR 03-06, 2024, p.226-228
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    Gate-sided hydrogen release as the origin of "permanent" NBTI degradation: from single defects to lifetimes

    Grasser, Tibor
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    Waltl, Michael
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    Wimmer, Yannick
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    Goes, Wolfgang
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    Kosik, R.
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    Rzepa, Gerhard
    Proceedings paper
    2015, IEEE International Electron Devices Meeting - IEDM, 7/12/2015, p.535-538
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    Impact of mixed negative bias temperature instability and hot carrier stress on MOSFET characteristics – Part II: theory

    Jech, Markus
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    Ulmann, Bianka
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    Rzepa, Gerhard
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    Tyaginov, Stanislav  
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    Grill, Alexander  
    Journal article
    2019, IEEE Transactions on Electron Devices, (66) 1, p.241-248
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    Improved PBTI reliability in junction-less nFETs fabricated at low thermal budget for 3D sequential integration

    Wu, Zhicheng  
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    Franco, Jacopo  
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    Vandooren, Anne  
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    Kaczer, Ben  
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    Roussel, Philippe  
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    Rzepa, Gerhard
    Proceedings paper
    2018, International Integrated Reliability Workshop - IIRW 2018, 7/10/2018, p.5.2
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    Low thermal budget dual-dipole gate stacks engineered for sufficient BTI reliability in novel integration schemes

    Franco, Jacopo  
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    Wu, Zhicheng  
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    Rzepa, Gerhard
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    Vandooren, Anne  
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    Arimura, Hiroaki  
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    Claes, Dieter  
    Proceedings paper
    2019-12, IEEE Electron Devices Technology and Manufacturing (EDTM) Conference 2019, 12/03/2019, p.215-216
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    Microscopic oxide defects causing BTI, RTN, and SILC on high-K FinFETs

    Rzepa, Gerhard
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    Waltl, Michael
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    Goes, Wolfgang
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    Kaczer, Ben  
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    Grasser, Tibor
    Proceedings paper
    2015, International Conference on Simulation of Semiconductor Processes and Devices - SISPAD, 9/09/2015, p.144-147
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    Mixed hot-carrier/bias temperature instability degradation regimes in full {VG, VD} bias space: implications and peculiarities

    Jech, Markus
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    Rott, Gunnar
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    Reisinger, Hans
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    Tyaginov, Stanislav  
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    Rzepa, Gerhard
    Journal article
    2020, IEEE Transactions on Electron Devices, (67) 8, p.3315-3322
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    Modeling the Hysteresis of Current-Voltage Characteristics in 4H-SiC Transistors

    Vasilev, Alexander
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    Jech, Markus
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    Grill, Alexander  
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    Rzepa, Gerhard
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    Schleich, Christian
    Proceedings paper
    2020, IEEE International Integrated Reliability Workshop (IIRW), OCT 04-NOV 01, 2020, p.31-34
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