Browsing by Author "Scholze, Frank"

Actinic characterization of EUV photomasks by EUV scatterometry

Alternative materials for high numerical aperture extreme ultraviolet lithography mask stacks

Assessing stability of metal tellurides as alternative photomask materials for extreme ultraviolet lithography

Characterization of optical material properties for alternative EUV mask absorber materials

Characterization of Ru4-xTax (x = 1,2,3) alloy as material candidate for EUV low-n mask

CNTs in the context of EUV pellicle history

Determination of optical constants of thin films in the EUV

EUV optical characterization of alternative membrane materials

Evaluation of optical material parameters for advanced absorbers on EUV masks

High NA EUV lithography simulation using new calibrated mask model

Imaging impact of multilayer tuning in EUV masks, experimental validation

Improving EUV imaging at tighter pitch using a tuned-ML mask stack

Lifetime test on EUV photomask with EBL2

Mitigating EUV mask 3D effects by alternative metal absorbers

Modeling EUV mask using alternative materials for mask 3D effect compensation

Nested Sampling aided determination of tantalum optical constants in the EUV spectral range

Ni-Al alloys as alternative EUV mask absorber

Novel EUV mask absorber evaluation in support of next-generation EUV imaging

On the optical constants of cobalt in the M-absorption edge region

Optical constants for EUV scatterometry