Browsing by Author "Van Look, Lieve"

A new concept to qualify pattern shift on EUV scanners

A practical alternating PSM modeling and OPC approach to deal with 3D mask effects for the 65nm node and beyond

Accurate mapping of dose variations on EUV scanners using dose-to-clear exposures and optical ellipsometry

Alternative EUV mask technology for mask 3D effect compensation

Alternative EUV mask technology to compensate for mask 3D effects

Capture probability of assembly defects in 14 nm half-pitch line/space DSA patterns

Carbon nanotube pellicles: imaging results of the first full-field extreme ultraviolet exposures

Characterization and control of dynamic lens heating effects under high-volume manufacturing conditions

CNT pellicles: Imaging results of the first full-field EUV exposures

Combined illumination sources for hyper-NA contact hole printing

Comparing positive and negative tone development process for printing the metal and contact layers of the 32- and 22-nm node

Defect capture sensitivity in 14 nm half-pitch line/space DSA patterns

Defect mitigation and root cause studies in 14 nm half-pitch chemo-epitaxy directed self-assembly LiNe flow

Defect mitigation and root cause studies in imec's 14 nm half-pitch chemo-epitaxy DSA flow

Defect reduction and defect stability in imec's 14nm half pitch chemo-epitaxy DSA flow

Effect of laser bandwidth tuning on line/space and contact printing at 1.35NA

Enhanced vortex pinning by a composite antidot lattice in a superconducting Pb film

EUVL is being inserted in HVM in 2019 : what are the mask related challenges remaining ?

Evaluation of Lines and Spaces printing and general understanding of imaging with dark field low-n mask

Evaluation of local CD and placement distribution on EUV mask and its impact on wafer