Browsing by Author "Zanoni, Enrico"
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Publication A comprehensive reliability investigation of the voltage-, temperature- and device geometry-dependence of the gate degradation on state-of-the-art GaN-on-Si HEMTs
Proceedings paper2010-12, IEEE International Electron Device Meeting - IEDM, 6/12/2010, p.472-472Publication AlGaNGaN-based HEMTs failure physics and reliability: mechanisms affecting gate edge and Schottky junction
Journal article2013, IEEE Transactions on Electron Devices, (60) 10, p.3119-3131Publication Analysis of the drain-to-substrate leakage of power HEMTs grown on highly resistive silicon substrate
Proceedings paper2018, GaN Marathon 2.0, 18/04/2018, p.38-39Publication Analysis of threshold voltage instabilities in semi-vertical GaN-on-Si FETs
Journal article2020, Applied Physics Express, (13) 2, p.24004Publication Breakdown investigation in GaN-based MIS-HEMT devices
;Marino, Fabio ;Bisi, Davide ;Meneghini, Matteo ;Verzellesi, GiovanniZanoni, EnricoProceedings paper2014, 44th European Solid-State Device Conference - ESSDERC, 22/09/2014, p.377-380Publication Challenges and Perspectives for Vertical GaN-on-Si Trench MOS Reliability: From Leakage Current Analysis to Gate Stack Optimization
Journal article review2021, MATERIALS, (14) 9, p.2316Publication Degradation mechanisms in AlGaN/GaN HEMTs submitted to off and on-state stress conditions
Proceedings paper2012, 6th Space Agency - MOD Workshop on Wideband Gap Semiconductors and Components, 8/10/2012Publication Degradation of AlGaN/GaN HEMTs below the "critical voltage": a time-dependent analysis
Proceedings paper2012, International Conference on Compound Semiconductor Manufacturing Technology - CSMantech, 23/04/2012Publication Degradation of AlGaN/GaN Schottky diodes on silicon: Role of defects at the AlGaNGaN interface
Journal article2013, Applied Physics Letters, (102) 16, p.163501Publication Degradation of GaN-HEMTs with p-GaN Gate: Dependence on temperature and on geometry
Proceedings paper2017, IEEE International Reliability Physics Symposium - IRPS, 2/04/2017, p.4B-5.1-4B-5.5Publication Demonstration of Bilayer Gate Insulator for Improved Reliability in GaN-on-Si Vertical Transistors
;Mukherjee, Kalparupa ;De Santi, Carlo ;Meneghesso, GaudenzioZanoni, EnricoProceedings paper2020, IEEE International Reliability Physics Symposium (IRPS), APR 28-MAY 30, 2020Publication Electroluminescence analysis of time-dependent reverse-bias degradation of HEMTs: a complete model
;Meneghini, Matteo ;Stocco, Antonio ;Bertini, Marco ;Ronchi, NicolòChini, AlessandroProceedings paper2011, IEEE International Electron Devices Meeting - IEDM, 5/12/2011, p.469-472Publication Evaluation of novel carrier substrates for high reliability and integrated GaN devices in a 200 mm complementary metal-oxide semiconductor compatible process
Journal article2018, MRS Communications, 84, p.1387-1394Publication Evidence of hot-electron degradation in GaN-based MIS-HEMTs submitted to high temperature constant source current stress
Journal article2016, IEEE Electron Device Letters, (37) 11, p.1415-1417Publication Evidence of time-dependent vertical breakdown in GaN-on-Si HEMTs
Journal article2017, IEEE Transactions on Electron Devices, (64) 9, p.3616-3621Publication Exploration of gate trench module for vertical GaN devices
Journal article2020, Microelectronics Reliability, 114, p.113828Publication Field- and current-driven degradation of GaN-based power HEMTs with p-GaN gate: dependence on Mg-doping level
Journal article2017, Microelectronics Reliability, 76-77, p.298-303Publication Gate conduction mechanisms and lifetime modeling of p-gate AlGaN/GaN high-electron-mobility transistors
Journal article2018, IEEE Transactions on Electron Devices, (65) 12, p.5365-5372Publication Gate module study for performance improvement in vertical GaN device
Proceedings paper2021, WOCSDICE 2021 - 44th Workshop on Copound Semiconductor Devices and Integrated Circuits held in Europe, 14/06/2020, p.70-71Publication Gate stability of GaN-based HEMTs with p-type gate
Journal article2016, Electronics, (5) 2, p.10.3390/electron
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