Browsing by author "Kauerauf, Thomas"
Now showing items 1-20 of 128
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6Å EOT Si0.45Ge0.55 pMOSFET with optimized reliability (VDD=1V): Meeting the NBTI lifetime target at ultra-thin EOT
Franco, Jacopo; Kaczer, Ben; Eneman, Geert; Mitard, Jerome; Stesmans, Andre; Afanasiev, Valeri; Kauerauf, Thomas; Roussel, Philippe; Toledano-Luque, Maria; Cho, Moon Ju; Degraeve, Robin; Grasser, Tibor; Ragnarsson, Lars-Ake; Witters, Liesbeth; Tseng, Joshua; Takeoka, Shinji; Wang, Wei-E; Hoffmann, Thomas Y.; Groeseneken, Guido (2010) -
A comprehensive reliability investigation of the voltage-, temperature- and device geometry-dependence of the gate degradation on state-of-the-art GaN-on-Si HEMTs
Marcon, Denis; Kauerauf, Thomas; Medjdoub, Farid; Das, Jo; Van Hove, Marleen; Srivastava, Puneet; Cheng, Kai; Leys, Maarten; Mertens, Robert; Decoutere, Stefaan; Meneghesso, Gaudenzio; Zanoni, Enrico; Borghs, Gustaaf (2010-12) -
A comprehensive study of channel hot-carrier degradation in short channel MOSFETs with high-k dielectrics
Amat, Esteve; Kauerauf, Thomas; Rodríguez, Rosana; Nafría, Montse; Aymerich, Xavier; Degraeve, Robin; Groeseneken, Guido (2013) -
A low-power HKMG CMOS platform compatible with DRAM node 2x and beyond
Ritzenthaler, Romain; Schram, Tom; Spessot, Alessio; Caillat, Christian; Aoulaiche, Marc; Cho, Moon Ju; Noh, Kyung Bong; Son, Yunik; Na, Hoon Jo; Kauerauf, Thomas; Douhard, Bastien; Nazir, Aftab; Chew, Soon Aik; Milenin, Alexey; Altamirano Sanchez, Efrain; Schoofs, Geert; Albert, Johan; Sebaai, Farid; Vecchio, Emma; Paraschiv, Vasile; Vandervorst, Wilfried; Lee, Sun Ghil; Collaert, Nadine; Fazan, Pierre; Horiguchi, Naoto; Thean, Aaron (2014) -
A new TDDB reliability prediction methodology accounting for multiple SBD and wear out
Sahhaf, Sahar; Degraeve, Robin; Roussel, Philippe; Kaczer, Ben; Kauerauf, Thomas; Groeseneken, Guido (2009) -
A novel methodology for sensing the breakdown location and its application to the reliability study of ultra-thin Hf-silicate gate dielectrics
Crupi, Felice; Kauerauf, Thomas; Degraeve, Robin; Pantisano, Luigi; Groeseneken, Guido (2005-08) -
Abrupt breakdown in dielectric/metal gate stacks: a potential reliability limitation?
Kauerauf, Thomas; Degraeve, Robin; Zahid, Mohammed; Cho, Moon Ju; Kaczer, Ben; Roussel, Philippe; Groeseneken, Guido; Maes, Herman; De Gendt, Stefan (2005) -
Achievements and challenges for the electrical performance of MOSFETs with high-k gate dielectrics
Groeseneken, Guido; Pantisano, Luigi; Ragnarsson, Lars-Ake; Degraeve, Robin; Houssa, Michel; Kauerauf, Thomas; Roussel, Philippe; De Gendt, Stefan; Heyns, Marc (2004) -
Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2007-09) -
Achieving low-VT Ni-FUSI CMOS via Lanthanide incorporation in the gate stack
Veloso, Anabela; Yu, HongYu; Lauwers, Anne; Chang, Shou-Zen; Adelmann, Christoph; Onsia, Bart; Demand, Marc; Brus, Stephan; Vrancken, Christa; Singanamalla, Raghunath; Lehnen, Peer; Kittl, Jorge; Kauerauf, Thomas; Vos, Rita; O'Sullivan, Barry; Van Elshocht, Sven; Mitsuhashi, Riichirou; Whittemore, G.; Yin, K.M.; Niwa, Masaaki; Hoffmann, Thomas; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2008) -
Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS
Shickova, Adelina; Kauerauf, Thomas; Rothschild, Aude; Aoulaiche, Marc; Sahhaf, Sahar; Kaczer, Ben; Veloso, Anabela; Torregiani, Cristina; Pantisano, Luigi; Lauwers, Anne; Zahid, Mohammed; Rost, Tim; Tigelaar, H.; Pas, M.; Fretwell, J.; McCormack, J.; Hoffmann, Thomas; Kerner, Christoph; Chiarella, Thomas; Brus, Stephan; Harada, Yoshinao; Niwa, Masaaki; Kaushik, Vidya; Maes, Herman; Absil, Philippe; Groeseneken, Guido; Biesemans, Serge; Kittl, Jorge (2007) -
Advanced PBTI reliability with 0.69nm EOT GdHfO gate dielectric
Cho, Moon Ju; Aoulaiche, Marc; Degraeve, Robin; Kaczer, Ben; Kauerauf, Thomas; Ragnarsson, Lars-Ake; Adelmann, Christoph; Van Elshocht, Sven; Hoffmann, Thomas Y.; Groeseneken, Guido (2011) -
As-grown donor-like traps in low-k dielectrics and their impact on intrinsic TDDB reliability
Tang, Baojun; Croes, Kristof; Barbarin, Yohan; Wang, Yunqi; Degraeve, Robin; Li, Yunlong; Toledano Luque, Maria; Kauerauf, Thomas; Boemmels, Juergen; Tokei, Zsolt; De Wolf, Ingrid (2014) -
Bias-temperature instability of Si and Si(Ge)-channel sub-1nm EOT p-MOS devices: challenges and solutions
Groeseneken, Guido; Aoulaiche, Marc; Cho, Moon Ju; Franco, Jacopo; Kaczer, Ben; Kauerauf, Thomas; Mitard, Jerome; Ragnarsson, Lars-Ake; Roussel, Philippe; Toledano Luque, Maria (2013) -
BTI reliability of advanced gate stacks for beyond silicon devices: challenges and opportunities
Groeseneken, Guido; Franco, Jacopo; Cho, Moon Ju; Kaczer, Ben; Toledano Luque, Maria; Roussel, Philippe; Kauerauf, Thomas; Alian, AliReza; Mitard, Jerome; Arimura, Hiroaki; Lin, Dennis; Waldron, Niamh; Sioncke, Sonja; Witters, Liesbeth; Mertens, Hans; Ragnarsson, Lars-Ake; Heyns, Marc; Collaert, Nadine; Thean, Aaron; Steegen, An (2014-12) -
Channel hot carrier degradation mechanism in long/short channel n-FinFETs
Cho, Moon Ju; Roussel, Philippe; Kaczer, Ben; Degraeve, Robin; Franco, Jacopo; Aoulaiche, Marc; Chiarella, Thomas; Kauerauf, Thomas; Horiguchi, Naoto; Groeseneken, Guido (2013) -
Channel hot-carrier degradation in pMOS and nMOS short channel transistors with high-k dielectric stack
Amat, Esteve; Kauerauf, Thomas; Degraeve, Robin; Rodríguez, Rosana; Nafría, Montse; Aymerich, Xavier; Groeseneken, Guido (2010) -
Channel hot-Carrier degradation in short channel devices with high-k/metal gate stacks
Amat, Esteve; Kauerauf, Thomas; Degraeve, Robin; Nafría, Montse; Aymerich, Xavier; Groeseneken, Guido (2009) -
Channel hot-carrier degradation in short-channel transistors with high-k/metal gate stacks
Amat, Esteve; Kauerauf, Thomas; Degraeve, Robin; De Keersgieter, An; Rodríguez, Rosana; Nafría, Montse; Aymerich, Xavier; Groeseneken, Guido (2009) -
Channel hot-carrier degradation under static stress in short channel transistors with high-k/metal gate stacks
Amat, E.; Kauerauf, Thomas; Degraeve, Robin; De Keersgieter, An; Rodríguez, R.; Nafría, M.; Aymerich, X.; Groeseneken, Guido (2008)