Browsing by author "Locorotondo, Sabrina"

157nm resist process performance and integration challenges on a full field scanner

Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004)

193nm immersion lithography for high performance silicon photonic circuits

Selvaraja, Shankar; Absil, Philippe; Van Campenhout, Joris; Winroth, Gustaf; Murdoch, Gayle; Locorotondo, Sabrina; Milenin, Alexey; Delvaux, Christie; Ong, Patrick; Sterckx, Gunther; Lepage, Guy; Pathak, Shibnath; Bogaerts, Wim; Van Thourhout, Dries; Xie, Weiqiang (2014)

A 0.314mm2 6T-SRAM cell built with tall triple-gate devices for 45nm node applications using 0.75NA 193nm lithography

Nackaerts, Axel; Ercken, Monique; Demuynck, Steven; Lauwers, Anne; Baerts, Christina; Bender, Hugo; Boullart, Werner; Collaert, Nadine; Degroote, Bart; Delvaux, Christie; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandervorst, Wilfried; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Jurczak, Gosia; Biesemans, Serge (2004-12)

A new complementary hetero-junction vertical tunnel-FET integration scheme

Rooyackers, Rita; Vandooren, Anne; Verhulst, Anne; Walke, A.; Devriendt, Katia; Locorotondo, Sabrina; Demand, Marc; Bryce, George; Loo, Roger; Hikavyy, Andriy; Vandeweyer, Tom; Huyghebaert, Cedric; Collaert, Nadine; Thean, Aaron (2013)

Challenges building a 22nm node 6T-SRAM cell using immersion lithography

Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Demand, Marc; Delvaux, Christie; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2009)

Challenges in patterning 45nm node multiple-gate devices and SRAM cells

Ercken, Monique; Delvaux, Christie; Baerts, Christina; Locorotondo, Sabrina; Degroote, Bart; Wiaux, Vincent; Nackaerts, Axel; Rooyackers, Rita; Verhaegen, Staf; Pollentier, Ivan (2004)

Challenges in using optical lithography for the building of a 22 nm node 6T=-SRAM cell

Ercken, Monique; Altamirano Sanchez, Efrain; Baerts, Christina; Brus, Stephan; De Backer, Johan; Delvaux, Christie; Demand, Marc; Horiguchi, Naoto; Locorotondo, Sabrina; Vandeweyer, Tom; Veloso, Anabela; Verhaegen, Staf (2010)

CMOS integration of dual work function phase controlled Ni FUSI with simultaneous integration of nMOS (NiSi) and pMOS (Ni-rich silicide) gates on HfSiON

Lauwers, Anne; Veloso, Anabela; Hoffmann, Thomas Y.; Van Dal, Mark; Vrancken, Christa; Brus, Stephan; Locorotondo, Sabrina; de Marneffe, Jean-Francois; Sijmus, Bram; Kubicek, Stefan; Chiarella, Thomas; Kmieciak, Malgorzata; Opsomer, Karl; Niwa, Masaaki; Mitsuhashi, Riichirou; Kottantharayil, Anil; Yu, HongYu; Demeurisse, Caroline; Verbeeck, Rita; de Potter de ten Broeck, Muriel; Absil, Philippe; Maex, Karen; Jurczak, Gosia; Biesemans, Serge; Kittl, Jorge (2005-12)

CMP-less integration of fully Ni-silicided metal gates in FinFETs by simultaneous silicidation of the source, drain, and the gate using a novel dual hard mask approach

Kottantharayil, Anil; Verheyen, Peter; Collaert, Nadine; Dixit, Abhisek; Kaczer, Ben; Snow, Jim; Vos, Rita; Locorotondo, Sabrina; Degroote, Bart; Shi, Xiaoping; Rooyackers, Rita; Mannaert, Geert; Brus, Stephan; Yim, Yong Sik; Lauwers, Anne; Goodwin, Michael; Kittl, Jorge; Van Dal, Mark; Richard, Olivier; Veloso, Anabela; Kubicek, Stefan; Beckx, Stephan; Boullart, Werner; De Meyer, Kristin; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2005)

Demonstration of Ni fully GermanoSilicide as a pFET gate electrode candidate on HfSiON

Yu, HongYu; Singanamalla, Raghunath; Opsomer, Karl; Augendre, Emmanuel; Simoen, Eddy; Kittl, Jorge; Kubicek, Stefan; Severi, Simone; Shi, Xiaoping; Brus, Stephan; Zhao, Chao; de Marneffe, Jean-Francois; Locorotondo, Sabrina; Shamiryan, Denis; Van Dal, Mark; Veloso, Anabela; Lauwers, Anne; Niwa, Masaaki; Maex, Karen; De Meyer, Kristin; Absil, Philippe; Jurczak, Gosia; Biesemans, Serge (2005)

Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology

Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12)

Double patterning with dual hard mask for 28nm node devices and below

Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013)

Double patterning with dual hard mask for 28nm node devices and below

Hody, Hubert; Paraschiv, Vasile; Vecchio, Emma; Locorotondo, Sabrina; Winroth, Gustaf; Athimulam, Raja; Boullart, Werner (2013)

Exploring double patterning approaches for 22-nm half-pitch gate structures

Locorotondo, Sabrina; Vangoidsenhoven, Diziana; Wouters, Johan M. D.; Miller, Andy; Demand, Marc; Boullart, Werner (2008)

FinFETs and their futures

Horiguchi, Naoto; Parvais, Bertrand; Chiarella, Thomas; Collaert, Nadine; Veloso, Anabela; Rooyackers, Rita; Verheyen, Peter; Witters, Liesbeth; Redolfi, Augusto; De Keersgieter, An; Brus, Stephan; Zschaetzsch, Gerd; Ercken, Monique; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Jurczak, Gosia; Vandervorst, Wilfried; Hoffmann, Thomas Y.; Biesemans, Serge (2011)

FinFETs and their futures

Horiguchi, Naoto; Parvais, Bertrand; Chiarella, Thomas; Collaert, Nadine; Veloso, Anabela; Rooyackers, Rita; Verheyen, Peter; Witters, Liesbeth; Redolfi, Augusto; De Keersgieter, An; Brus, Stephan; Zschaetzsch, Gerd; Ercken, Monique; Altamirano Sanchez, Efrain; Locorotondo, Sabrina; Demand, Marc; Jurczak, Gosia; Vandervorst, Wilfried; Hoffmann, Thomas Y.; Biesemans, Serge (2010)

Ge-source vertical tunnel FETs using a novel replacement-source integration scheme

Rooyackers, Rita; Vandooren, Anne; Verhulst, Anne; Walke, Amey; Simoen, Eddy; Devriendt, Katia; Locorotondo, Sabrina; Demand, Marc; Bryce, George; Loo, Roger; Hikavyy, Andriy; Vandeweyer, Tom; Huyghebaert, Cedric; Collaert, Nadine; Thean, Aaron (2014-12)

High yield sub-0.1μm² 6T-SRAM Cells, featuring high-k/metal-gate Finfet devices, double gate patterning, a novel Fin etch strategy, full-field EUV lithography and optimized junction design & layout

Horiguchi, Naoto; Demuynck, Steven; Ercken, Monique; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Vandeweyer, Tom; Baerts, Christina; Mannaert, Geert; Truffert, Vincent; Verluijs, j; Alaerts, Wilfried; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Vandenberghe, Geert; Beyer, Gerald; Lauwers, Anne; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2010)

Highly reliable and extremely stable SiGe micro-mirrors

Gromova, Maria; Haspeslagh, Luc; Verbist, Agnes; Du Bois, Bert; Van Hoof, Rita; Eyckens, Brenda; Sijmus, Bram; De Wolf, Ingrid; Simons, Veerle; Muller, Philippe; Lauwagie, Tom; Willegems, Myriam; Locorotondo, Sabrina; Boullart, Werner; Baert, Kris; Witvrouw, Ann (2007-01)

Highly reliable CMOS-integrated 11MPixel SiGe-based micro-mirror arrays for high-end industrial applications

Haspeslagh, Luc; De Coster, Jeroen; Varela Pedreira, Olalla; De Wolf, Ingrid; Du Bois, Bert; Verbist, Agnes; Van Hoof, Rita; Willegems, Myriam; Locorotondo, Sabrina; Bryce, George; Vaes, Jan; van Drieenhuizen, Bert; Witvrouw, Ann (2008)