Browsing by author "Van Roey, Frieda"

100-nm generation contact patterning by low temperature 193-nm resist reflow process

Van Driessche, Veerle; Lucas, Kevin; Van Roey, Frieda; Grozev, Grozdan; Tzviatkov, Plamen (2002)

100nm generation contact patterning by low temperature 193nm resist reflow process

Van Driessche, V.; Grozev, G.; Lucas, K.; Van Roey, Frieda; Tzviatkov, Plamen (2002)

157-nm photoresist process optimization for a full-field scanner

Light, Scott; Stepanenko, Nickolay; Gronheid, Roel; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke (2004-03)

157nm full field imaging

Hermans, Jan; Van Roey, Frieda; Van Den Heuvel, Dieter; Goethals, Mieke; Ronse, Kurt (2003-08)

157nm resist process performance and integration challenges on a full field scanner

Goethals, Mieke; Gronheid, Roel; List, Scott; Ercken, Monique; Van Roey, Frieda; Van Den Heuvel, Dieter; Locorotondo, Sabrina; Ronse, Kurt (2004)

193 nm lithography on a full field scanner

Goethals, Mieke; Pollers, Ingrid; Jaenen, Patrick; Van Roey, Frieda; Ronse, Kurt; Heskamp, B.; Davies, G. (1999)

193-nm contact photoresist reflow feasibility study

Lucas, Kevin; Slezak, Mark; Ercken, Monique; Van Roey, Frieda (2001)

300 mm-wafer metrology for area-selective deposition in nanoscale patterns: A case study for ruthenium atomic layer deposition

Clerix, Jan-Willem; Warad, L.; Hung, J.; Hody, Hubert; Van Roey, Frieda; Lorusso, Gian; Koret, R.; Lee, W. T.; Shah, K.; Delabie, Annelies (2023)

A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography

de Marneffe, Jean-Francois; Goossens, Danny; Vandervorst, Alain; Demuynck, Steven; Goethals, Mieke; Hermans, Jan; Van Roey, Frieda; Baudemprez, Bart; Brus, Stephan; Vrancken, Christa (2008)

A novel method for characterizing resist performance

Van Steenwinckel, David; Gronheid, Roel; Van Roey, Frieda; Willems, Patrick; Lammers, Jeroen H. (2008)

A novel method for characterizing resist performance

Van Steenwinckel, David; Gronheid, Roel; Lammers, J.H.; Myers, Alan; Van Roey, Frieda; Willems, Patrick (2007)

Assessment of EUV resist performance for sub-22nm hp lines and 26nm hp contacts on NXE3100

Goethals, Mieke; Van Roey, Frieda; Hosokawa, Kohei; Hoefnagels, Rik; Niroomand, Ardavan; Foubert, Philippe (2012)

CD-SEM distortion quantification for EPE metrology and contour analysis

Dillen, Harm; Kiers, Ton; Halder, Sandip; Wallow, Thomas I.; Van Roey, Frieda (2017)

Computational nanometrology of line-edge roughness: noise effectd, cross-line correlations and the role of etch transfer

Constantoudis, Vassilios; Papavieros, George; Lorusso, Gian; Rutigliani, Vito; Van Roey, Frieda; Gogolides, Evangelos (2018)

Deep learning nanometrology of line edge roughness

Giannatou, Eva; Constantoudis, Vassilios; Papavieros, George; Papageorgiou, Harris; Rutigliani, Vito; Lorusso, Gian; Van Roey, Frieda; Gogolides, Evangelos (2019)

Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology

Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12)