Browsing by author "Carter, Richard"
Now showing items 1-20 of 33
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Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Characterisation of AlCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Carter, Richard; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2002) -
Charge trapping, mobility degradation and reliability of high-e gate stacks
Cartier, Eduard; Kerber, Andreas; Pantisano, Luigi; Carter, Richard; Kauerauf, Thomas; Degraeve, Robin (2002) -
Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
Tsai, Wilman; Ragnarsson, Lars-Ake; Chen, P.J.; Onsia, Bart; Carter, Richard; Cartier, Eduard; Young, Edward; Green, Martin; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003) -
Compatibility of polysilicon with HfO2-based gate dielectrics for CMOS applications
Kaushik, V.; De Gendt, Stefan; Caymax, Matty; Young, E.; Röhr, Erika; Van Elshocht, Sven; Delabie, Annelies; Claes, Martine; Shi, Xiaoping; Chen, Jerry; Carter, Richard; Conard, Thierry; Vandervorst, Wilfried; Schaekers, Marc; Heyns, Marc (2003) -
Constant voltage stress induced degradation in HfO2/SiO2 gate dielectric stacks
Xu, Zhen; Houssa, Michel; Carter, Richard; Naili, Mohamed; De Gendt, Stefan; Heyns, Marc (2002) -
Crystallization behaviour of ZrO2/Al2O3-based high-k gate stacks
Zhao, Chao; Richard, Olivier; Bender, Hugo; Houssa, Michel; Carter, Richard; De Gendt, Stefan; Heyns, Marc; Young, Edward; Tsai, Wilman; Roebben, G.; Van der Biest, O.; Haukka, S. (2001) -
Effect of Al-content and post deposition annealing on the electrical properties of ultra-thin HfAlxOy layers
Carter, Richard; Tsai, Wilman; Young, Edward; Maes, Jan; Chen, P.J.; Delabie, Annelies; Zhao, Chao; De Gendt, Stefan; Heyns, Marc (2003) -
Electrical characterization of high-k materials prepared by Atomic Layer CVD (ALCVD)
Carter, Richard; Cartier, Eduard; Caymax, Matty; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Heyns, Marc; Kauerauf, Thomas; Kerber, Andreas; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Tsai, Wilman; Young, Edward (2001) -
Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications
Caymax, Matty; Brijs, Bert; Carter, Richard; Claes, Martine; Conard, Thierry; De Gendt, Stefan; Delabie, Annelies; Heyns, Marc; Richard, Olivier; Vandervorst, Wilfried; Zhao, Chao; Maes, Jan; Chen, Jerry; Cosnier, Vincent; Green, Martin; Kaushik, Vidya; Kluth, Jon; Tsai, Wilman (2002) -
Growth and physical properties of MOCVD-deposited hafnium oxide films and their properties on silicon
Van Elshocht, Sven; Caymax, Matty; De Gendt, Stefan; Conard, Thierry; Petry, Jasmine; Claes, Martine; Witters, Thomas; Zhao, Chao; Brijs, Bert; Richard, Olivier; Bender, Hugo; Vandervorst, Wilfried; Carter, Richard; Kluth, Jon; Daté, L.; Pique, D.; Heyns, Marc (2003) -
High k dielectric materials prepared by atomic layer CVD
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Guido; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, Wilfried; Wilhelm, Rudi; Yang, E.; Zhao, Chao (2001) -
Implementation of high-k gate dielectrics - a status update
De Gendt, Stefan; Chen, Jerry; Carter, Richard; Cartier, Eduard; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Maes, Jan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Röhr, Erika; Van Elshocht, Sven; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2003) -
Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Tsai, Wilman; Chen, Jian; Carter, Richard; Cartier, Eduard; Kluth, Jon; Richard, Olivier; Claes, Martine; Lin, Steven; Nohira, Hiroshi; Conard, Thierry; Caymax, Matty; Young, Edward; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Manabe, Yukiko; Maes, Jan; Rittersma, Chris; Besling, Wim; Roozeboom, F. (2002) -
Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Nohira, Hiroshi; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Pétry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jos; Tuominen, Marko (2001) -
Investigation of fluorine in dry ultrathin silicon oxides
Vereecke, Guy; Röhr, Erika; Carter, Richard; Conard, Thierry; De Witte, Hilde; Heyns, Marc (2000) -
Investigation of fluorine in dry ultrathin silicon oxides
Vereecke, Guy; Röhr, Erika; Carter, Richard; Conard, Thierry; De Witte, Hilde; Heyns, Marc (2001) -
Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow
Kubicek, Stefan; Carter, Richard; Cartier, Eduard; Lujan, Guilherme; Kerber, Andreas; Kaushik, Vidya; Chen, P.J.; De Gendt, Stefan; Heyns, Marc (2002) -
Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
Kubicek, Stefan; Chen, Jerry; Ragnarsson, Lars-Ake; Carter, Richard; Kaushik, Vidya; Lujan, Guilherme; Cartier, Eduard; Henson, Kirklen; Pantisano, Luigi; Beckx, Stephan; Jaenen, Patrick; Boullart, Werner; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; De Meyer, Kristin (2003) -
Issues, achievements and challenges towards integration of high-k dielectrics
Caymax, Matty; De Gendt, Stefan; Vandervorst, Wilfried; Heyns, Marc; Bender, Hugo; Carter, Richard; Conard, Thierry; Degraeve, Robin; Groeseneken, Guido; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Van Elshocht, Sven; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002)