Browsing Articles by imec author "25b47126a1335604d64d42f2c4f02a881dd178cd"
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2D and 3D photoresist line roughness characterization
Vaglio Pret, Alessandro; Kunnen, Eddy; Gronheid, Roel; Pargon, Erwine; Luere, Olivier; Bianchi, Davide (2013) -
Challenges in line edge roughness metrology in directed self-assembly lithography: placement errors and cross-line correlations
Constantoudis, Vassilios; Papvieros, George; Gogolides, Evangelos; Vaglio Pret, Alessandro; Pathangi Sriraman, Hari; Gronheid, Roel (2017) -
Critical dimension uniformity and contact edge roughness in extreme ultraviolet lithography: effect of photoacid generator, sensitizer and quencher
Murugesan Kuppuswamy, Vijaya-Kumar; Constantoudis, Vassilios; Gogolides, Evangelos; Vaglio Pret, Alessandro; Gronheid, Roel (2013) -
Effect of PAG distribution on ArF and EUV resist performance
Gronheid, Roel; Rathsack, Benjamin; Bernard, Sophie; Vaglio Pret, Alessandro; Nafus, Kathleen; Hatakeyama, Shinichi (2009) -
Evidence of speckle in extreme-UV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Engelen, Jan; Pei-Yang, Yan; Leeson, Michael; Younkin, Todd (2012-10) -
Impact of post-litho linewidth roughness smoothing processes on the post-etch patterning result
Foubert, Philippe; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; Gronheid, Roel (2011-07) -
Induced variability of cell-to-cell interference by line edge roughness in nand flash arrays
Poliakov, Pavel; Blomme, Pieter; Vaglio Pret, Alessandro; Miranda Corbalan, Miguel; Gronheid, Roel; Verkest, Diederik; Van Houdt, Jan; Dehaene, Wim (2012) -
Line edge and width roughness smoothing by plasma treatment
De Schepper, Peter; Hansen, Terje; Altamirano Sanchez, Efrain; Vaglio Pret, Alessandro; El Otell, Ziad; Boullart, Werner; De Gendt, Stefan (2014) -
Line width roughness mitigation in chemically amplified resist by post-litho processes
Vaglio Pret, Alessandro; Gronheid, Roel (2010) -
Linking EUV lithography line edge roughness and 16 nm NAND memory performance
Vaglio Pret, Alessandro; Poliakov, Pavel; Gronheid, Roel; Blomme, Pieter; Miranda Corbalan, Miguel; Dehaene, Wim; Verkest, Diederik; Van Houdt, Jan; Bianchi, Davide (2012) -
Mask absorber roughness impact in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Graves, Trey; Smith, Mark D.; Biafore, John (2011) -
Mask effects on resist variability in extreme ultraviolet lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Engelen, Jan; Yan, Pei-Yang; Leeson, Michael; Younkin, Todd; Garidis, Kostas; Biafore, John (2013) -
Mask line roughness contribution in EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel (2011) -
Pattern roughness mitigation of 22 nm lines and spaces: The impact of H2 plasma treatment
De Schepper, Peter; Vaglio Pret, Alessandro; El Otell, Ziad; Hansen, Terje; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Resist roughness evaluation and frequency analysis: metrological challenges and potential solutions for EUV lithography
Vaglio Pret, Alessandro; Gronheid, Roel; Ishimoto, Toru; Sekiguchi, Kohei (2010) -
Resolution-linewidth roughness-sensitivity performance tradeoffs for an extreme ultraviolet polymer bound photo-acid generator resist
Gronheid, Roel; Vaglio Pret, Alessandro; Rathsack, Benjamin; Hooge, Joshua; Scheer, Steven; Nafus, Kathleen; Shite, Hideo; Kitano, Junichi (2011) -
Roughness characterization in the frequency domain and linewidth roughness mitigation with post-lithography processes
Vaglio Pret, Alessandro; Gronheid, Roel; Foubert, Philippe (2010-12) -
The impact of pupil plane filtering on mask roughness transfer
Baylav, Burak; Maloney, Chris; Levinson, Zac; Bekaert, Joost; Vaglio Pret, Alessandro; Smith, Bruce W. (2013) -
The influence of H2 plasma treatment on LWR mitigation: the importance of EUV photoresist composition
De Schepper, Peter; El Otell, Ziad; Vaglio Pret, Alessandro; Altamirano Sanchez, Efrain; De Gendt, Stefan (2015) -
Three litho-process-litho approaches for 2D double patterning at the 32nm half pitch node
Wong, Patrick; Gronheid, Roel; Wiaux, Vincent; Vaglio Pret, Alessandro; Verhaegen, Staf; Vandenbroeck, Nadia (2010)