Browsing by Author "Cartier, Eduard"
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Publication A study of relaxation current in high-k gate stacks
Journal article2004-03, IEEE Trans. Electron Devices, (51) 3, p.402-408Publication ALD HfO2 surface preparation study
Proceedings paper2003, Novel Materials and Processes for Advanced CMOS, 2/12/2002, p.179-184Publication Characterization of high-k films grown by atomic layer deposition
Oral presentation2002, MRS Spring MeetingPublication Charge trapping and dielectric reliability in alternative gate dielectrics: a key challenge for integration
Oral presentation2002, Workshop on Dielectrics in Insulators - WODIMPublication Charge trapping and dielectric reliability in alternative gate dielectrics: a key challenge for integration
Proceedings paper2003, Proceedings of the 12th Workshop on Dielectrics in Microelectronics, 18/11/2002, p.45-52Publication Charge trapping and dielectric reliability of SiO2/AI2O3 gate stacks with TiN electrodes
Journal article2003, IEEE Trans. Electron Devices, (50) 5, p.1261-1269Publication Charge trapping and electron mobility degradation in MOCVD hafnium silicate gate dielectric stack structures
Publication Charge trapping, mobility degradation and reliability of high-e gate stacks
Publication Charging instability in n-channel MOSFETs with SiO2/HfO2 gate dielectrics
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
Proceedings paper2003, Symposium on VLSI Technology. Digest of Technical Papers, 10/06/2003, p.21-22Publication Correlation between charge Injection and trapping in SiO2/HfO2 gate stacks
Oral presentation2003, Insulating Films on Semiconductors Conference - INFOS. 13th Bi-Annual ConferencePublication Direct measurement of the inversion charge in MOSFETs: application to mobility extraction in alternative gate dielectrics
Proceedings paper2003, VLSI Technology Symposium, 10/06/2003, p.159-160Publication Dynamics of threshold voltage instability in stacked high-k dielectrics: role of the interfacial oxide
Proceedings paper2003, VLSI Technology Symposium, 10/06/2003, p.163-164Publication Electrical characterization of high-k materials prepared by Atomic Layer CVD (ALCVD)
Proceedings paper2001, Extended Abstracts of the International Workshop on Gate Insulator. IWGI 2001; 1-2 November 2001; Tokyo, Japan., p.94-99Publication Implementation of high-k gate dielectrics - a status update
Proceedings paper2003, Extended Abstracts of International Workshop on Gate Insulator - IWGI, 6/11/2003, p.10-14Publication Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Proceedings paper2002, Semiconductor Silicon 2002. Proceedings of the 9th International Symposium on Silicon Materials Science and Technology, 12/05/2002, p.747-760Publication Interface state passivation in conventional SiO2/HfO2 p-channel FETs
Oral presentation2003, Insulating Films on Semiconductors - INFOS. 13th Bi-Annual ConferencePublication Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow
Oral presentation2002, 33rd IEEE Semiconductor Interface Specialists Conference - SISCPublication Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow
Proceedings paper2003, 33rd European Solid-State Devices Research Conference - ESSDERC, 16/09/2003, p.251-254Publication Issues, achievements and challenges towards integration of high-k dielectrics
Proceedings paper2002, Frontiers in Electronics. Future Chips. Proceedings of the 2002 Workshop, 6/01/2002, p.?-?