Browsing by Author "Ikota, Masami"
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Publication 3D measurement of 3D NAND memory hole with CD-SEM and tilted FIB
Publication Contact inspection and resistance - capacitance measurement of Si nanowire with SEM voltage contrast
Journal article2019, Journal of Micro/Nanolithography MEMS and MOEMS, (18) 2, p.21205Publication Contact inspection of Si nanowire with SEM voltage contrast
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850BPublication e-beam metrology of thin resist for high NA EUVL
; ; ; ; ; Journal article review2023, JAPANESE JOURNAL OF APPLIED PHYSICS, (62) SG, p.Art. SG0808Publication EB metrology of Ge channel gate-all-around FET: buckling evaluation and EB damage assessment
Proceedings paper2020, Metrology, Inspection, and Process Control for Microlithography XXXIV, 23/02/2020, p.1132525Publication Electron beam metrology for advanced technology nodes
Journal article2019, Japanese Journal of Applied Physics, (58) SD, p.SD0801Publication Enabling CD SEM metrology for 5nm technology node and beyond
Proceedings paper2017, Metrology, Inspection, and Process Control for Microlithography XXXI, 26/02/2017, p.1014512Publication Impact of annealing temperature on DSA process: toward faster assembly kinetics
Proceedings paper2018, Advances in Patterning Materials and Processes XXXV, 24/02/2018, p.105860TPublication Linewidth and roughness measurement of SAOP by using FIB and planer-TEM as reference metrology
Proceedings paper2019, Metrology, Inspection, and Process Control for Microlithography XXXIII, 24/02/2019, p.109590QPublication Metrology of Thin Resist for High NA EUVL
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.12053OOPublication Need for LWR metrology standardization: the imec roughness protocol
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, 17, p.41009Publication Precise measurement of thin film thickness in 3D-NAND device with CD-SEM
Publication Precise measurement of thin-film thickness in 3D-NAND device with CD-SEM
Journal article2018, Journal of Micro/Nanolithography MEMS and MOEMS, (17) 2, p.24002Publication Regularized Autoencoder for The Analysis of Multivariate Metrology Data
Proceedings paper2022, Conference on Metrology, Inspection, and Process Control XXXVI Part of SPIE Advanced Lithography and Patterning Conference, FEB 24-MAY 27, 2022, p.Art. 120530VPublication The need for LWR metrology standardization: the imec roughness protocol
Proceedings paper2018, Metrology, Inspection, and Process Control for Microlithography XXXII, 25/02/2018, p.105850DPublication Variability study with CD-SEM metrology for STT-MRAM: correlation analysis between physical dimensions and electrical property of the memory element