Browsing by Author "Kaushik, Vidya"

Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS

Charge characterisation in metal-gate/high-k layers: Effect of post-deposition annealing and gate electrode

Effect of postdeposition anneal conditions on defect density of HfO2 layers measured by wet etching

Effectiveness of nitridation of hafnium silicate dielectrics: a comparison between thermal and plasma nitridation

Effects of interactions between HfO2 and poly-Si on MOSCAP and MESFET electrical behaviour

Electrical characterization of capacitors with AVD- deposited hafnium silicates as high-k gate dielectric

Growth and characterization of single and mixed metal oxides by ALCVD on various surfaces for high-k gate stack applications

High-k dielectrics integration prospects

High-k gate stack engineering – towards meeting low standby power and high performance targets

High-k metal gate MOSFETs: Impact of extrinsic process condition on the gate-stack quality. A mobility study

Implementation of high-k gate dielectrics - a status update

Investigation of poly-Si/HfO2 gate stacks in a self-aligned 65 nm NMOS process flow

Investigation of poly-Si/HfO2 gate stacks in a self-aligned 70nm MOS process flow

Issues, achievements and challenges towards integration of high-k dielectrics

Issues, achievements and challenges towards intergration of high-k dielectrics

Observation and characterization of defects in HfO2 high-k gate dielectric layers

Observation and characterization of defects in HfO2 High-K gate dielectric layers

On the nature of weak spots in high-k layers submitted to anneals

Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey

Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey