Browsing by author "Young, Edward"
Now showing items 1-20 of 35
-
Alternative gate insulator materials for future generation MOSFETs
Heyns, Marc; Bender, Hugo; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Degraeve, Robin; De Witte, Hilde; Groeseneken, Guido; Haukka, S.; Henson, Kirklen; Houssa, Michel; Kubicek, Stefan; Maes, Jos; Naili, Mohamed; Nohira, Hiroshi; Tsai, Wilman; Tuominen, Marko; Vandervorst, R.; Wilhelm, Rudi; Young, Edward; Zhao, Chao (2001) -
Characterisation of AlCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Carter, Richard; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2002) -
Characterisation of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2002) -
Characterization of ALCVD Al2O3-ZrO2 nanolaminates, link between electrical and structural properties
Besling, Wim; Young, Edward; Conard, Thierry; Zhao, Chao; Vandervorst, Wilfried; Caymax, Matty; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Haukka, S. (2001) -
Characterization of AlCVD-Al2O3 and ZrO2 layer using X-ray photoelectron spectroscopy
Nohira, Hiroshi; Tsai, Wilman; Besling, Wim; Young, Edward; Pétry, Jasmine; Conard, Thierry; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko (2001) -
Comparison of sub 1 nm TiN/HfO2 with Poly-Si/HfO2 gate stacks u sing scaled chemical oxide interfaces
Tsai, Wilman; Ragnarsson, Lars-Ake; Chen, P.J.; Onsia, Bart; Carter, Richard; Cartier, Eduard; Young, Edward; Green, Martin; Caymax, Matty; De Gendt, Stefan; Heyns, Marc (2003) -
Crystallization behaviour of ZrO2/Al2O3-based high-k gate stacks
Zhao, Chao; Richard, Olivier; Bender, Hugo; Houssa, Michel; Carter, Richard; De Gendt, Stefan; Heyns, Marc; Young, Edward; Tsai, Wilman; Roebben, G.; Van der Biest, O.; Haukka, S. (2001) -
Effect of Al-content and post deposition annealing on the electrical properties of ultra-thin HfAlxOy layers
Carter, Richard; Tsai, Wilman; Young, Edward; Maes, Jan; Chen, P.J.; Delabie, Annelies; Zhao, Chao; De Gendt, Stefan; Heyns, Marc (2003) -
Electrical characterization of high-k materials prepared by Atomic Layer CVD (ALCVD)
Carter, Richard; Cartier, Eduard; Caymax, Matty; De Gendt, Stefan; Degraeve, Robin; Groeseneken, Guido; Heyns, Marc; Kauerauf, Thomas; Kerber, Andreas; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Tsai, Wilman; Young, Edward (2001) -
High temperature grazing incidence XRD study on in-situ crystallization in ultra-thin oxide films
Zhao, Chao; Roebben, G.; Young, Edward; Bender, Hugo; Houssa, Michel; Naili, Mohamed; De Gendt, Stefan (2000) -
Implementation of high-k gate dielectrics - a status update
De Gendt, Stefan; Chen, Jerry; Carter, Richard; Cartier, Eduard; Caymax, Matty; Claes, Martine; Conard, Thierry; Delabie, Annelies; Deweerd, Wim; Kaushik, Vidya; Kerber, Andreas; Kubicek, Stefan; Maes, Jan; Niwa, M.; Pantisano, Luigi; Puurunen, Riikka; Ragnarsson, Lars-Ake; Schram, Tom; Shimamoto, Yasuhiro; Tsai, Wilman; Röhr, Erika; Van Elshocht, Sven; Witters, Thomas; Young, Edward; Zhao, Chao; Heyns, Marc (2003) -
In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction
Zhao, Chao; Roebben, G.; Bender, Hugo; Young, Edward; Haukka, S.; Houssa, Michel; Naili, Mohamed; De Gendt, Stefan; Heyns, Marc; Van der Biest, O. (2001) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer CVD
De Witte, Hilde; Passefort, Sophie; Besling, Wim; Maes, Jos; Eason, K.; Young, Edward; Heyns, Marc (2002) -
In-line electrical metrology for high-k gate dielectrics deposited by atomic layer CVD
De Witte, Hilde; Passefort, Sophie; Besling, Wim; Maes, Jan; Eason, K.; Young, Edward; Rittersma, Chris; Heyns, Marc (2003) -
Infrared interface analysis of high-k dielectrics deposited by atomic layer chemical vapour deposition
Cosnier, Vincent; Bender, Hugo; Caymax, Matty; Chen, Jian; Conard, Thierry; Nohira, Hiroshi; Richard, Olivier; Tsai, Wilman; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; De Gendt, Stefan; Heyns, Marc; Maes, Jos; Tuominen, Marko; Rochat, N.; Olivier, M.; Chabli, A. (2001) -
Integration issues of polysilicon with high k dielectrics deposited by Atomic Layer Chemical Vapor Deposition
Tsai, Wilman; Chen, Jian; Carter, Richard; Cartier, Eduard; Kluth, Jon; Richard, Olivier; Claes, Martine; Lin, Steven; Nohira, Hiroshi; Conard, Thierry; Caymax, Matty; Young, Edward; Vandervorst, Wilfried; De Gendt, Stefan; Heyns, Marc; Manabe, Yukiko; Maes, Jan; Rittersma, Chris; Besling, Wim; Roozeboom, F. (2002) -
Interfacial stability of high-k dielectrics deposited by atomic layer chemical vapor deposition
Tsai, Wilman; Nohira, Hiroshi; Carter, Richard; Caymax, Matty; Conard, Thierry; De Gendt, Stefan; Heyns, Marc; Pétry, Jasmine; Richard, Olivier; Vandervorst, Wilfried; Young, Edward; Zhao, Chao; Maes, Jos; Tuominen, Marko (2001) -
Issues, achievements and challenges towards integration of high-k dielectrics
Caymax, Matty; De Gendt, Stefan; Vandervorst, Wilfried; Heyns, Marc; Bender, Hugo; Carter, Richard; Conard, Thierry; Degraeve, Robin; Groeseneken, Guido; Kubicek, Stefan; Lujan, Guilherme; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Van Elshocht, Sven; Zhao, Chao; Cartier, Eduard; Chen, Jerry; Cosnier, Vincent; Jang, Se Aug; Kaushik, Vidya; Kerber, Andreas; Kluth, Jon; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Issues, achievements and challenges towards intergration of high-k dielectrics
Heyns, Marc; Bender, Hugo; Caymax, Matty; Carter, R; Claes, Martine; Conard, Thierry; Boullart, Werner; De Gendt, Stefan; Degraeve, Robin; Deweerd, Wim; Groeseneken, Guido; Houssa, Michel; Kubicek, Stefan; Lujan, Guilherme; Nohira, H.; Pantisano, Luigi; Petry, Jasmine; Röhr, Erika; Vandervorst, Wilfried; Van Elshocht, Sven; Xu, Zhen; Zhao, Chao; Cartier, E.; Chen, J.; Cosnier, V.; Green, M.; Jang, S.E.; Kaushik, Vidya; Kerber, A.; Kluth, J.; Lin, S.; Tsai, Wilman; Young, Edward; Manabe, Y. (2002) -
Low-frequency noise study of n-MOSFETs with HfO2 gate dielectric
Simoen, Eddy; Mercha, Abdelkarim; Pantisano, Luigi; Claeys, Cor; Young, Edward (2003)