Browsing by author "Vanhaelemeersch, Serge"
Now showing items 41-60 of 121
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Etch process development for FLARE(tm) for dual damascene architecture using a N2/O2 plasma
Thompson, Heike; Vanhaelemeersch, Serge; Maex, Karen; Van Ammel, Annemie; Beyer, Gerald; Coenegrachts, Bart; Vervoort, Iwan; Waeterloos, Joost; Struyf, Herbert; Palmans, Roger; Forester, Lynn (1999) -
Feasability of TiSi2 and CoSi2 for sub quarter micron processes
Vanhaelemeersch, Serge; Baklanov, Mikhaïl; Maex, Karen (1996) -
Feasibility of TiSi2 and CoSi2 for sub quarter micron processes: problems of the etch selectivity
Baklanov, Mikhaïl; Vanhaelemeersch, Serge; Maex, Karen (1997) -
Foton geïnduceerd etsen van koper en vorming van koper nanodraden
Dictus, Dries; De Gendt, Stefan; Vinckier, Chris; Boullart, Werner; Vanhaelemeersch, Serge (2008) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Growth of copper and copper compound nanowires
Dictus, Dries; Shamiryan, Denis; Paraschiv, Vasile; Boullart, Werner; De Gendt, Stefan; Baklanov, Mikhaïl; Vinckier, Chris; Vanhaelemeersch, Serge (2008) -
HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
Paraschiv, Vasile; Claes, Martine; Baklanov, Mikhaïl; Boullart, Werner; De Gendt, Stefan; Vanhaelemeersch, Serge (2004) -
HF based solutions for HfO2 removal. Effect of pH and temperature on HfO2:SiO2 etch selectivity
Paraschiv, Vasile; Claes, Martine; Baklanov, Mikhaïl; Boullart, Werner; De Gendt, Stefan; Vanhaelemeersch, Serge (2005) -
High aspect ratio via etch development for Cu nails in 3-D-stacked ICs
Van Aelst, Joke; Struyf, Herbert; Boullart, Werner; Vanhaelemeersch, Serge (2008) -
High Q inductor add-on module in thick Cu/SiLK/sup TM/ single damascene
Jenei, Snezana; Decoutere, Stefaan; Winderickx, Gillis; Struyf, Herbert; Tokei, Zsolt; Vervoort, Iwan; Vos, I.; Jaenen, Patrick; Carbonell, Laure; De Jaeger, Brice; Donaton, R. A.; Vanhaelemeersch, Serge; Maex, Karen; Nauwelaers, Bart (2001) -
ICP and ICPsm process development, a) dry strip only, b) low temperature SiC oxidation removal
Boullart, Werner; Mannaert, Geert; Baklanov, Mikhaïl; Shamiryam, D.; Vanhaelemeersch, Serge (1999) -
Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film
Travaly, Youssef; Eyckens, Brenda; Carbonell, Laure; Rothschild, Aude; Le, Quoc Toan; Brongersma, Sywert; Ciofi, Ivan; Struyf, Herbert; Furukawa, Yukiko; Stucchi, Michele; Schaekers, Marc; Bender, Hugo; Rosseel, Erik; Vanhaelemeersch, Serge; Maex, Karen; Gaillard, F.; Van Autryve, Luc; Rabinzohn, P. (2002) -
Implementation of high-K and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, K.; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2004) -
Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development
Beckx, Stephan; Demand, Marc; Locorotondo, Sabrina; Henson, Kirklen; Claes, Martine; Paraschiv, Vasile; Shamiryan, Denis; Jaenen, Patrick; Boullart, Werner; De Gendt, Stefan; Biesemans, Serge; Vanhaelemeersch, Serge; Vertommen, Johan; Coenegrachts, Bart (2005-06) -
Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates
Shamiryan, Denis; Paraschiv, Vasile; Locorotondo, Sabrina; Beckx, Stephan; Boullart, Werner; Vanhaelemeersch, Serge (2005) -
Integration of Cu and low-K dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures
Donaton, R. A.; Coenegrachts, Bart; Maenhoudt, Mireille; Pollentier, Ivan; Struyf, Herbert; Vanhaelemeersch, Serge; Vos, I.; Meuris, Marc; Fyen, Wim; Beyer, Gerald; Tokei, Zsolt; Stucchi, Michele; Vervoort, Iwan; De Roest, David; Maex, Karen (2001) -
Integration of SrBi2Ta2O9 (SBT) based FRAM capacitors: plasma etch issues and solutions
Paraschiv, Vasile; Boullart, Werner; Vanhaelemeersch, Serge; Lisoni, Judit; Schwitters, Michael; Maes, David; Wouters, Dirk; Casella, P.; Zambrano, R.; Vecchio, G.; Van Autryve, Luc (2004) -
Integration of tall triple-gate devices with inserted TaxNy gate in a 0.274μm² 6T-SRAM cell and advanced CMOS logic circuits
Witters, Liesbeth; Collaert, Nadine; Nackaerts, Axel; Demand, Marc; Demuynck, Steven; Delvaux, Christie; Lauwers, Anne; Baerts, Christina; Beckx, Stephan; Boullart, Werner; Brus, Stephan; Degroote, Bart; de Marneffe, Jean-Francois; Dixit, Abhisek; De Meyer, Kristin; Ercken, Monique; Goodwin, Michael; Hendrickx, Eric; Heylen, Nancy; Jaenen, Patrick; Laidler, David; Leray, Philippe; Locorotondo, Sabrina; Maenhoudt, Mireille; Moelants, Myriam; Pollentier, Ivan; Ronse, Kurt; Rooyackers, Rita; Van Aelst, Joke; Vandenberghe, Geert; Vandeweyer, Tom; Vanhaelemeersch, Serge; Van Hove, Marleen; Van Olmen, Jan; Verhaegen, Staf; Versluijs, Janko; Vrancken, Christa; Wiaux, Vincent; Willems, Patrick; Wouters, Johan M. D.; Jurczak, Gosia; Biesemans, Serge (2005) -
Integration of the 3MS low-k CVD material in a 0.18 μm Cu single damascene process
Gao, Teng; Gray, William; Van Hove, Marleen; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge; Maex, Karen (2000) -
Integration of the 3MS low-k CVD material in a 0.18µm Cu single damascene process
Gao, Teng; Gray, William; Van Hove, Marleen; Struyf, Herbert; Meynen, Herman; Vanhaelemeersch, Serge (1999)