Browsing by author "Goossens, Danny"
Now showing items 1-20 of 22
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30-nm half-pitch metal patterning using MotifTM critical dimension shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2009) -
30nm half-pitch metal patterning using MotifTM CD shrink technique and double patterning
Versluijs, Janko; de Marneffe, Jean-Francois; Goossens, Danny; Op de Beeck, Maaike; Vandeweyer, Tom; Wiaux, Vincent; Struyf, Herbert; Maenhoudt, Mireille; Brouri, Mohand; Vertommen, Johan; Kim, Ji Soo; Zhu, Helen; Sadjadi, Reza (2008) -
A metal hardmask approach for the contact patterning of a 0.186 μm² SRAM cell exposed with EUV lithography
de Marneffe, Jean-Francois; Goossens, Danny; Vandervorst, Alain; Demuynck, Steven; Goethals, Mieke; Hermans, Jan; Van Roey, Frieda; Baudemprez, Bart; Brus, Stephan; Vrancken, Christa (2008) -
CMOS compatible heater fabrication approaches for thermal tuning of photonics devices
Masood, Adil; Pantouvaki, Marianna; Goossens, Danny; Lepage, Guy; Verheyen, Peter; Van Thourhout, Dries; Absil, Philippe; Bogaerts, Wim (2012) -
CMOS-compatible tungsten heaters for silicon photonic waveguides
Masood, Adil; Pantouvaki, Marianna; Goossens, Danny; Lepage, Guy; Verheyen, Peter; Van Thourhout, Dries; Absil, Philippe; Bogaerts, Wim (2012) -
Demonstration of scaled 0.099μm² FinFET 6T-SRAM cell using full-field EUV lithography for (Sub-)22nm node single-patterning technology
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Locorotondo, Sabrina; Lazzarino, Frederic; Altamirano Sanchez, Efrain; Huffman, Craig; De Keersgieter, An; Brus, Stephan; Demand, Marc; Struyf, Herbert; De Backer, Johan; Hermans, Jan; Delvaux, Christie; Baudemprez, Bart; Vandeweyer, Tom; Van Roey, Frieda; Baerts, Christina; Goossens, Danny; Dekkers, Harold; Ong, Patrick; Heylen, Nancy; Kellens, Kristof; Volders, Henny; Hikavyy, Andriy; Vrancken, Christa; Rakowski, Michal; Verhaegen, Staf; Dusa, Mircea; Romijn, Leon; Pigneret, Charles; van Dijk, Andre; Schreutelkamp, Rob; Cockburn, Andrew; Gravey, Virginie; Meiling, H.; Hultermans, B.; Lok, S.; Shah, K.; Rajagopalan, R.; Gelatos, J.; Richard, Olivier; Bender, Hugo; Vandenberghe, Geert; Beyer, Gerald; Absil, Philippe; Hoffmann, Thomas Y.; Ronse, Kurt; Biesemans, Serge (2009-12) -
Development of a metal gate and silicon selective "dry ash only" process for combined extension and halo implanted photo resist
Mannaert, Geert; Baklanov, Mikhaïl; Goossens, Danny; Vrancken, Christa; Boullart, Werner (2008) -
Dielectric reliability of 70 nm pitch air-gap interconnect structures
Pantouvaki, Marianna; Sebaai, Farid; Kellens, Kristof; Goossens, Danny; Vereecke, Bart; Versluijs, Janko; Van Besien, Els; Caluwaerts, Rudy; Marrant, Koen; Bender, Hugo; Moussa, Alain; Struyf, Herbert; Beyer, Gerald (2011) -
Etch challenges brought by the metal hardmask approach for advanced contact patterning with fluorocarbon-based plasma
de Marneffe, Jean-Francois; Goossens, Danny; Shamiryan, Denis; Lazzarino, Frederic; Struyf, Herbert; Boullart, Werner (2008) -
Fabrication and characterization of CMOS-compatible integrated tungsten heaters for thermo-optic tuning in silicon photonics devices
Masood, A.; Pantouvaki, Marianna; Goossens, Danny; Lepage, Guy; Verheyen, Peter; Van Campenhout, Joris; Absil, Philippe; Van Thourhout, Dries; Bogaerts, Wim (2014-07) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Imaging performance of the EUV alpha demo tool at IMEC
Lorusso, Gian; Hermans, Jan; Goethals, Mieke; Baudemprez, Bart; Van Roey, Frieda; Myers, Alan; Kim, In Sung; Kim, Byeong Soo; Jonckheere, Rik; Niroomand, Ardavan; Lok, E.; Van Dijk, A.; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Ronse, Kurt (2008) -
Impact of O2-based plasma strip chemistries on the electrochemical behavior of TiN electrodes for biomedical applications
Collaert, Nadine; Mannaert, Geert; Paraschiv, Vasile; Goossens, Danny; Demand, Marc; Eberle, Wolfgang (2012-11) -
Low-voltage, low-loss, multi-Gb/s silicon mirco-ring modulator based on a MOS capacitor
Van Campenhout, Joris; Pantouvaki, Marianna; Verheyen, Peter; Selvaraja, Shankar; Lepage, Guy; Yu, Hui; Lee, Willie; Wouters, Johan M. D.; Goossens, Danny; Moelants, Myriam; Bogaerts, Wim; Absil, Philippe (2012) -
Metal hard-mask based double patterning for 22nm and beyond
Struyf, Herbert; de Marneffe, Jean-Francois; Goossens, Danny; Hendrickx, Dirk; Huffman, Craig; Kunnen, Eddy; Lazzarino, Frederic; Milenin, Alexey; Shamiryan, Denis; Urbanowicz, Adam; Vandervorst, Alain; Boullart, Werner (2010) -
On the origin of grass formation in MHM-based single-damascene low-k etch
de Marneffe, Jean-Francois; Goossens, Danny; Conard, Thierry; Hendrickx, Dirk; Struyf, Herbert; Boullart, Werner (2009) -
Patterning of 25nm contact holes at 90nm pitch: combination of line/space double exposure immersion lithography and plasma-assisted shrink technology
de Marneffe, Jean-Francois; Lazzarino, Frederic; Goossens, Danny; Vandervorst, Alain; Richard, Olivier; Shamiryan, Denis; Xu, Kaidong; Truffert, Vincent; Boullart, Werner (2011) -
Plasma process optimization for dual pattern 30nm half pitch interconnect application
Huffman, Craig; de Marneffe, Jean-Francois; Demuynck, Steven; Goossens, Danny; Beyer, Gerald; Struyf, Herbert (2009) -
Residue formation in MHM-based low-k etch
Goossens, Danny; de Marneffe, Jean-Francois; Conard, Thierry; Hendrickx, Dirk; Struyf, Herbert; Boullart, Werner (2008) -
Short- and damage-free process for patterning magnetic tunnel junctions for high-density application
Radisic, Dunja; Souriau, Laurent; Paraschiv, Vasile; Goossens, Danny; Yamashita, Fumiko; Koizumi, Nao; Tahara, Shigeru; Nishimura, Eichi; Kim, Woojin; Donadio, Gabriele Luca; Crotti, Davide; Swerts, Johan; Mertens, Sofie; Lin, Tsann; Couet, Sebastien; Piumi, Daniele; Kar, Gouri Sankar; Furnemont, Arnaud (2015)