Browsing by author "Versluijs, Janko"
Now showing items 21-40 of 72
-
Double patterning EDA solutions for the 32nm HP and beyond
Bailey, George; Tritchkov, Alexander; Park, Jea-Woo; Hong, Le; Wiaux, Vincent; Hendrickx, Eric; Verhaegen, Staf; Xie, Peng; Versluijs, Janko (2007) -
Double patterning process development at IMEC
Maenhoudt, Mireille; Vangoidsenhoven, Diziana; Vandeweyer, Tom; Gronheid, Roel; Versluijs, Janko; Miller, Andy (2008) -
Dry etch challenges in a 20 nm half-pitch single damascene spacer-defined patterning scheme
Kunnen, Eddy; Versluijs, Janko; Alaerts, Wilfried; Siew, Yong Kong; Struyf, Herbert; Beyer, Gerald (2010) -
Electrical comparison of iN7 EUV hybrid and EUV single patterning BEOL metal layers
Lariviere, Stephane; Wilson, Chris; Kutrzeba Kotowska, Bogumila; Versluijs, Janko; Decoster, Stefan; Mao, Ming; van der Veen, Marleen; Jourdan, Nicolas; El-Mekki, Zaid; Heylen, Nancy; Kesters, Els; Verdonck, Patrick; Beral, Christophe; Van Den Heuvel, Dieter; De Bisschop, Peter; Bekaert, Joost; Blanco, Victor; Ciofi, Ivan; Wan, Danny; Briggs, Basoene; Mallik, Arindam; Hendrickx, Eric; Kim, Ryan Ryoung han; McIntyre, Greg; Ronse, Kurt; Boemmels, Juergen; Tokei, Zsolt; Mocuta, Dan (2018) -
Enabling 3-level High Aspect Ratio Supervias for 3nm nodes and below
Montero Alvarez, Daniel; Vega Gonzalez, Victor; Feurprier, Yannick; Varela Pedreira, Olalla; Oikawa, Noriaki; Martinez Alanis, Gerardo Tadeo; Batuk, Dmitry; Puliyalil, Harinarayanan; Versluijs, Janko; De Coster, Hanne; Bazzazian, Nina; Jourdan, Nicolas; Kumar, Kaushik; Lazzarino, Frederic; Murdoch, Gayle; Park, Seongho; Tokei, Zsolt (2022-06-29) -
Enabling interconnect scaling with spacer-defined double patterning (SDDP)
Siew, Yong Kong; Stucchi, Michele; Versluijs, Janko; Roussel, Philippe; Kunnen, Eddy; Pantouvaki, Marianna; Beyer, Gerald; Tokei, Zsolt (2013) -
Experimental study of programming saturation in low-coupling planar high-k/metal gate Nand flash memory cells using a dedicated test structure
Blomme, Pieter; Tan, Chi Lim; Souriau, Laurent; Versluijs, Janko; Van den Bosch, Geert; Van Houdt, Jan (2014) -
Exploration of BEOL line-space patterning options at 12nm half-pitch and below
Decoster, Stefan; Lazzarino, Frederic; Petersen Barbosa Lima, Lucas; Li, Waikin; Versluijs, Janko; Halder, Sandip; Mallik, Arindam; Murdoch, Gayle (2018) -
Exploring the use of Tungsten-based Hard Masks in BEOL interconnects for 3nm node and beyond
Montero Alvarez, Daniel; Vega Gonzalez, Victor; Puliyalil, Harinarayanan; Nie, Jiuyuan; Yang, Jialing; Schleicher, Filip; Mclaughlin, Kevin; Versluijs, Janko; Lazzarino, Frederic; Park, Seongho; Tokei, Zsolt (2022-11-10) -
Full-field EUV and immersion lithography integration in 0.186μm² FinFET 6T-SRAM cell
Veloso, Anabela; Demuynck, Steven; Ercken, Monique; Goethals, Mieke; Demand, Marc; de Marneffe, Jean-Francois; Altamirano Sanchez, Efrain; De Keersgieter, An; Delvaux, Christie; De Backer, Johan; Brus, Stephan; Hermans, Jan; Baudemprez, Bart; Van Roey, Frieda; Lorusso, Gian; Baerts, Christina; Goossens, Danny; Vrancken, Christa; Mertens, Sofie; Versluijs, Janko; Truffert, Vincent; Huffman, Craig; Laidler, David; Heylen, Nancy; Ong, Patrick; Parvais, Bertrand; Rakowski, Michal; Verhaegen, Staf; Hikavyy, Andriy; Meiling, H.; Hultermans, B.; Romijn, L.; Pigneret, C.; Lok, S.; Van Dijk, A.; Shah, K.; Noori, A.; Gelatos, J.; Arghavani, R.; Schreutelkamp, Rob; Boelen, Pieter; Richard, Olivier; Bender, Hugo; Witters, Liesbeth; Collaert, Nadine; Rooyackers, Rita; Absil, Philippe; Lauwers, Anne; Jurczak, Gosia; Hoffmann, Thomas Y.; Vanhaelemeersch, Serge; Cartuyvels, Rudi; Ronse, Kurt; Biesemans, Serge (2008) -
Gate-all-around NWFETs vs. triple-gate FinFETs: junctionless vs. extensionless and conventional junction devices with controlled EWF modulation for multi-VT CMOS
Veloso, Anabela; Hellings, Geert; Cho, Moon Ju; Simoen, Eddy; Devriendt, Katia; Paraschiv, Vasile; Vecchio, Emma; Tao, Zheng; Versluijs, Janko; Souriau, Laurent; Dekkers, Harold; Brus, Stephan; Geypen, Jef; Lagrain, Pieter; Bender, Hugo; Eneman, Geert; Matagne, Philippe; De Keersgieter, An; Fang, W.; Collaert, Nadine; Thean, Aaron (2015) -
Hydrogen-plasma-enhanced thermal donor formation in n-type high-ressitivity MCZ silicon
Simoen, Eddy; Huang, Y.L.; Claeys, Cor; Rafi, J.M.; Job, R.; Fahrner, W.R.; Versluijs, Janko; Clauws, P. (2005) -
Hyper-NA imaging using two-beam interference
Hendrickx, Eric; Van Look, Lieve; Versluijs, Janko; Ronse, Kurt (2005) -
Immersion lithography and double patterning in advanced microelectronics
Vandeweyer, Tom; Bekaert, Joost; Ercken, Monique; Gronheid, Roel; Miller, Andy; Truffert, Vincent; Verhaegen, Staf; Versluijs, Janko; Wiaux, Vincent; Wong, Patrick; Vandenberghe, Geert; Maenhoudt, Mireille (2010) -
Impact of LER on BEOL dielectric reliability: a quantitative model and experimental validation
Tokei, Zsolt; Roussel, Philippe; Stucchi, Michele; Versluijs, Janko; Ciofi, Ivan; Carbonell, Laure; Beyer, Gerald; Cockburn, Andrew; Augustin, M.; Shah, Kavita (2009) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Vandervorst, Alain; Claes, Martine; Lux, Marcel; Versluijs, Janko; Alaerts, Wilfried; Van Besien, Els; Deweerdt, Bruno; Vaes, Jan; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, A.; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2008) -
Implementation of Ru based barriers in 50 nm half pitch single damascene Cu/SiCOH (k=2.5) structures
Carbonell, Laure; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Tokei, Zsolt; Hendrickx, Dirk; Struyf, Herbert; Claes, Martine; Versluijs, Janko; Van Besien, Els; Caluwaerts, Rudy; Cockburn, Andrew; Gravey, Virginie; Shah, Kavita; Al-Bayati, Amir; Fu, X.; Lubben, D.; Sundarrajan, A.; Beyer, Gerald (2009) -
Inflection points in interconnect research and trends for 2nm and beyond in order to solve the RC bottleneck
Tokei, Zsolt; Vega Gonzalez, Victor; Murdoch, Gayle; O'Toole, Martin; Croes, Kristof; Baert, Rogier; van der Veen, Marleen; Adelmann, Christoph; Soulie, Jean-Philippe; Boemmels, Juergen; Wilson, Chris; Park, Seongho; Sankaran, Kiroubanand; Pourtois, Geoffrey; Swerts, Johan; Paolillo, Sara; Decoster, Stefan; Mao, Ming; Lazzarino, Frederic; Versluijs, Janko; Blanco, Victor; Ercken, Monique; Kesters, Els; Le, Quoc Toan; Holsteyns, Frank; Heylen, Nancy; Teugels, Lieve; Devriendt, Katia; Struyf, Herbert; Morin, Pierre; Jourdan, Nicolas; Van Elshocht, Sven; Ciofi, Ivan; Gupta, Anshul; Zahedmanesh, Houman; Vanstreels, Kris; Na, Myung Hee (2020) -
Integration and dielectric reliability of 30nm 1/2 pitch structures in Aurora LK HM
Demuynck, Steven; Huffman, Craig; Claes, Martine; Suhard, Samuel; Versluijs, Janko; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Croes, Kristof; Struyf, Herbert; Vereecke, Guy; Verdonck, Patrick; De Roest, David; Beynet, Julien; Sprey, Hessel; Beyer, Gerald (2009) -
Integration and dielectric reliability of 30nm ½ pitch structures in Aurora® LK HM
Demuynck, Steven; Huffman, Craig; Claes, Martine; Suhard, Samuel; Versluijs, Janko; Volders, Henny; Heylen, Nancy; Kellens, Kristof; Croes, Kristof; Struyf, Herbert; Vereecke, Guy; Verdonck, Patrick; De Roest, David; Beynet, Julien; Sprey, Hessel; Beyer, Gerald (2010)