Browsing by Author "Pawlak, Malgorzata"

0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications

A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

Advanced capacitor dielectrics: towards 2x nm DRAM

ALD strontium titanates and their characterization

Applications of Ni-based silicides to 45 nm CMOS and beyond

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

Composition influence on the physical and electrical properties of SrxTi1-xOy-based MIM capacitors prepared by Atomic Layer Deposition using TiN bottom electrodes

Compositional study of BaSrTiO thin films for memory application

Controlled growth of rutile TiO2 by atomic layer deposition on oxidized ruthenium

Cost effective low Vt Ni-FUSI CMOS on SiON by means of Al implant (pMOS) and Yb+P implant (nMOS)

Crystallization study of thin ZrO2 ALD films on Al203 and on TiN for DRAM MIMCAP applications

Direct physical evidence of mechanisms of leakage and equivalent oxide thickness reduction in metal-insulator-metal capacitors based on RuOx/TiOx/SrxTiyOz/TiN stacks

Effect of deposition and anneal temperature on batch-ALD deposited ZrO2/Al2O3/ZrO2 films for DRAM MIM capacitor applications

Enabling 3X nm DRAM: Record low leakage 0.4 nm EOT MIM capacitors with novel stack engineering

High-k dielectrics and metal gates for future generation memory devices

High-k dielectrics and metal gates for future generation memory devices

High-k dielectrics for future generation memory devices

Higher-k ALD Sr-rich SrTiO3 for DRAM MIMCAP Application

Impact of crystallization behavior of SrxTiyOz films on electrical properties of metal-insulator-metal capacitors with TiN electrodes