Browsing by Author "Kittl, Jorge"

0.5 nm EOT low leakage ALD SrTiO3 on TiN MIM capacitors for DRAM applications

10x10nm2 Hf/HfOx crossbar resistive RAM with excellent performance, reliability and low-energy operation

A comparative study of the microstructure–dielectric properties of crystalline SrTiO3 ALD films obtained via seed layer approach

A comparison of spike, flash, SPER and laser annealing for 45nm CMOS

A Monte Carlo study of the low resistance state retention of HfOx based resistive switching memory

Achieving 9ps unloaded ring oscillator delay in FuSI/HfSiON with 0.8 nm EOT

Achieving low VT Ni-FUSI CMOS via lanthanide incorporation in the gate stack

Achieving low-VT Ni-FUSI CMOS via Lanthanide incorporation in the gate stack

Addressing key concerns for implementation of Ni FUSI into manufacturing for 45/32 nm CMOS

Advanced capacitor dielectrics: towards 2x nm DRAM

ALD strontium titanates and their characterization

Alternative high-k dielectrics for semiconductor applications

Alternative high-k dielectrics for semiconductor applications

Applications of Ni-based silicides to 45 nm CMOS and beyond

Atomic layer deposition of gadolinium aluminate layers using Gd(iPrCp)3, TMA, and O3 or H2O

Atomic layer deposition of Gd-doped HfO2 thin films

Atomic layer deposition of GdHfOx thin films

Atomic layer deposition of hafnium titanates dielectric layers

Atomic layer deposition of Ru and RuO2 for MIMCAP applications

Atomic layer deposition of Ru and RuO2 for MIMCAP applications