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3D sequential low temperature top tier devices using dopant activation with excimer laser anneal and strained silicon as performance boosters
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Authors
Vandooren, Anne
;
Wu, Zhicheng
;
Parihar, Narendra
;
Franco, Jacopo
;
Parvais, Bertrand
;
Matagne, Philippe
;
Debruyn, Haroen
;
Mannaert, Geert
;
Devriendt, Katia
;
Teugels, Lieve
;
Vecchio, Emma
;
Radisic, Dunja
;
Rosseel, Erik
;
Hikavyy, Andriy
;
Chan, BT
;
Waldron, Niamh
;
Mitard, Jerome
;
Besnard, G.
;
Alvarez, A.
;
Gaudin, G.
;
Schwarzenbach, W.
;
Radu, I.
;
Nguyen, B. Y.
;
Huet, K.
;
Tabata, T.
;
Mazzamuto, F.
;
Demuynck, Steven
;
Boemmels, Juergen
;
Collaert, Nadine
;
Horiguchi, Naoto
EISBN
978-1-7281-6460-1
ISSN
0743-1562
Conference
IEEE Symposium on VLSI Technology and Circuits
Journal
na
Title
3D sequential low temperature top tier devices using dopant activation with excimer laser anneal and strained silicon as performance boosters
Publication type
Proceedings paper
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Date
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2
20.500.12860/37753.2
*
2021-12-08T08:29:06Z
validation by library/open access desk
1
20.500.12860/37753
2021-11-02T15:59:26Z
*Selected version
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